The interaction of chlorine with Si(100)2 × 1 studied using soft X-ray photoemission and photon stimulated ion desorption

D. Sterratt; C. L. Greenwood; E. M. Williams; C. A. Muryn; P. L. Wincott; G. Thornton; E. Román

doi:10.1016/0039-6028(94)90406-5

The interaction of chlorine with Si(100)2 × 1 studied using soft X-ray photoemission and photon stimulated ion desorption

D. Sterratt, C. L. Greenwood, E. M. Williams^*, C. A. Muryn, P. L. Wincott, G. Thornton, E. Román

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

Chlorine adsorption on Si(100)2 × 1 at 295 K and 473 ± 50 K has been investigated using Si2p soft X-ray photoemission and photon stimulated ion desorption (PSID) at the SiL_2,3 edge. The photoemission results indicate that both monochloride and dichloride species are formed, with a ratio of approximately 2.5:1. Essentially identical results are obtained if the sample is exposed to chlorine from either an electrochemical cell or a gas bottle. The PSID yield of Cl⁺ ions at the SiL_2,3 edge is dominated by X-ray-induced electron stimulated desorption (XESD).

Original language	English
Pages (from-to)	269-273
Number of pages	5
Journal	Surface Science
Volume	307-309
Issue number	PART A
DOIs	https://doi.org/10.1016/0039-6028(94)90406-5
Publication status	Published - 20 Apr 1994

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title = "The interaction of chlorine with Si(100)2 × 1 studied using soft X-ray photoemission and photon stimulated ion desorption",

abstract = "Chlorine adsorption on Si(100)2 × 1 at 295 K and 473 ± 50 K has been investigated using Si2p soft X-ray photoemission and photon stimulated ion desorption (PSID) at the SiL2,3 edge. The photoemission results indicate that both monochloride and dichloride species are formed, with a ratio of approximately 2.5:1. Essentially identical results are obtained if the sample is exposed to chlorine from either an electrochemical cell or a gas bottle. The PSID yield of Cl+ ions at the SiL2,3 edge is dominated by X-ray-induced electron stimulated desorption (XESD).",

author = "D. Sterratt and Greenwood, {C. L.} and Williams, {E. M.} and Muryn, {C. A.} and Wincott, {P. L.} and G. Thornton and E. Rom{\'a}n",

year = "1994",

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doi = "10.1016/0039-6028(94)90406-5",

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pages = "269--273",

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T1 - The interaction of chlorine with Si(100)2 × 1 studied using soft X-ray photoemission and photon stimulated ion desorption

AU - Sterratt, D.

AU - Greenwood, C. L.

AU - Williams, E. M.

AU - Muryn, C. A.

AU - Wincott, P. L.

AU - Thornton, G.

AU - Román, E.

PY - 1994/4/20

Y1 - 1994/4/20

N2 - Chlorine adsorption on Si(100)2 × 1 at 295 K and 473 ± 50 K has been investigated using Si2p soft X-ray photoemission and photon stimulated ion desorption (PSID) at the SiL2,3 edge. The photoemission results indicate that both monochloride and dichloride species are formed, with a ratio of approximately 2.5:1. Essentially identical results are obtained if the sample is exposed to chlorine from either an electrochemical cell or a gas bottle. The PSID yield of Cl+ ions at the SiL2,3 edge is dominated by X-ray-induced electron stimulated desorption (XESD).

AB - Chlorine adsorption on Si(100)2 × 1 at 295 K and 473 ± 50 K has been investigated using Si2p soft X-ray photoemission and photon stimulated ion desorption (PSID) at the SiL2,3 edge. The photoemission results indicate that both monochloride and dichloride species are formed, with a ratio of approximately 2.5:1. Essentially identical results are obtained if the sample is exposed to chlorine from either an electrochemical cell or a gas bottle. The PSID yield of Cl+ ions at the SiL2,3 edge is dominated by X-ray-induced electron stimulated desorption (XESD).

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U2 - 10.1016/0039-6028(94)90406-5

DO - 10.1016/0039-6028(94)90406-5

M3 - Article

AN - SCOPUS:0028408235

SN - 0039-6028

VL - 307-309

SP - 269

EP - 273

JO - Surface Science

JF - Surface Science

IS - PART A

ER -

The interaction of chlorine with Si(100)2 × 1 studied using soft X-ray photoemission and photon stimulated ion desorption

Abstract

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