The interaction of chlorine with Si(100)2 × 1 studied using soft X-ray photoemission and photon stimulated ion desorption

D. Sterratt, C. L. Greenwood, E. M. Williams, C. A. Muryn, P. L. Wincott, G. Thornton, E. Román

Research output: Contribution to journalArticlepeer-review

Abstract

Chlorine adsorption on Si(100)2 × 1 at 295 K and 473 ± 50 K has been investigated using Si2p soft X-ray photoemission and photon stimulated ion desorption (PSID) at the SiL2,3 edge. The photoemission results indicate that both monochloride and dichloride species are formed, with a ratio of approximately 2.5:1. Essentially identical results are obtained if the sample is exposed to chlorine from either an electrochemical cell or a gas bottle. The PSID yield of Cl+ ions at the SiL2,3 edge is dominated by X-ray-induced electron stimulated desorption (XESD).

Original languageEnglish
Pages (from-to)269-273
Number of pages5
JournalSurface Science
Volume307-309
Issue numberPART A
DOIs
Publication statusPublished - 20 Apr 1994

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