The microstructural and thickness uniformity of zirconia coatings produced by r.f. ion plating

K. S. Fancey; S. J. Young; A. S. James; A. Matthews

doi:10.1016/0921-5093(93)90784-C

The microstructural and thickness uniformity of zirconia coatings produced by r.f. ion plating

K. S. Fancey, S. J. Young, A. S. James, A. Matthews

Materials Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

An ion plating system, which utilizes r.f. substrate biasing, was studied to determine the influence of source to substrate distance on the microstructure and thickness uniformity of zirconia coatings. Coating thickness measurements were used to evaluate parameters from equations which describe uniformity in absolute and relative terms with distance from the vapour source. The results show that microstructure and thickness uniformity are significantly influenced by the ratio of the plasma bombardment intensity and coating material arrival rate; energetic bombardment effects from the plasma become relatively more prominent on substrate surfaces positioned remotely from the source.

Original language	English
Pages (from-to)	171-175
Number of pages	5
Journal	Materials Science And Engineering A-Structural Materials Properties Microstructure And Processing
Volume	163
Issue number	2
DOIs	https://doi.org/10.1016/0921-5093(93)90784-C
Publication status	Published - 15 Apr 1993

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The microstructural and thickness uniformity of zirconia coatings produced by r.f. ion plating

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