Abstract
In this paper we investigate the formation of β-FeSi2 (from co-deposited layers of Fe and Si produced by ion beam assisted deposition) under a number of annealing regimes (annealing temperatures between 100 and 900 °C and times up to 18 h) by optical characterisation of the band edge parameters. The results have indicated that both annealing temperatures and times have a strong effect on the number of defects underneath the fundamental edge of absorption. The measurement temperature dependency of the band gap is also found to be dependent on the annealing conditions.
Original language | English |
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Pages (from-to) | 179-182 |
Number of pages | 4 |
Journal | Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms |
Volume | 188 |
Issue number | 1-4 |
DOIs | |
Publication status | Published - Apr 2002 |
Keywords
- Beta iron-disilicide
- FeSi
- IBAD