The structure and mechanical properties of Ti-Si-B coatings deposited by DC and pulsed-DC unbalanced magnetron sputtering

Martynas Audronis; A. Leyland; Allan Matthews; Fillip V. Kiryukhantsev-Korneev; Dmitry V. Shtansky; Evgeny A. Levashov

doi:10.1002/ppap.200731706

The structure and mechanical properties of Ti-Si-B coatings deposited by DC and pulsed-DC unbalanced magnetron sputtering

Martynas Audronis^*
, A. Leyland
, Allan Matthews
, Fillip V. Kiryukhantsev-Korneev
, Dmitry V. Shtansky
, Evgeny A. Levashov

^*Corresponding author for this work

Materials Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

The structure and mechanical properties of direct current (DC) and pulsed-DC unbalanced magnetron-sputtered Ti-Si-B thin films - hard coatings with the potential for excellent thermal stability and oxidation resistance - are investigated and reported in this paper. The coatings were deposited from composite sputter targets of titanium silicide/boride produced by self-propagating high-temperature synthesis (SHS), a novel and cost-effective technique to produce bulk materials of complex compositions which are difficult to synthesise by other means. Hard (up to 37 GPa) Ti-Si-B coatings possessing amorphous, nanocrystalline and crystalline structures were deposited. The application of pulsed magnetron sputtering (PMS) was found to affect significantly the coating properties such as structure, thickness, hardness (H), reduced elastic modulus (E_r) and thus H/E_r ratio.

Original language	English
Journal	Plasma Processes and Polymers
Volume	4
Issue number	SUPPL.1
DOIs	https://doi.org/10.1002/ppap.200731706
Publication status	Published - 1 Dec 2007

Keywords

Mechanical properties
Pulsed magnetron sputtering
Structure
Ti-Si-B coatings

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10.1002/ppap.200731706

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title = "The structure and mechanical properties of Ti-Si-B coatings deposited by DC and pulsed-DC unbalanced magnetron sputtering",

abstract = "The structure and mechanical properties of direct current (DC) and pulsed-DC unbalanced magnetron-sputtered Ti-Si-B thin films - hard coatings with the potential for excellent thermal stability and oxidation resistance - are investigated and reported in this paper. The coatings were deposited from composite sputter targets of titanium silicide/boride produced by self-propagating high-temperature synthesis (SHS), a novel and cost-effective technique to produce bulk materials of complex compositions which are difficult to synthesise by other means. Hard (up to 37 GPa) Ti-Si-B coatings possessing amorphous, nanocrystalline and crystalline structures were deposited. The application of pulsed magnetron sputtering (PMS) was found to affect significantly the coating properties such as structure, thickness, hardness (H), reduced elastic modulus (Er) and thus H/Er ratio.",

keywords = "Mechanical properties, Pulsed magnetron sputtering, Structure, Ti-Si-B coatings",

author = "Martynas Audronis and A. Leyland and Allan Matthews and Kiryukhantsev-Korneev, \{Fillip V.\} and Shtansky, \{Dmitry V.\} and Levashov, \{Evgeny A.\}",

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T1 - The structure and mechanical properties of Ti-Si-B coatings deposited by DC and pulsed-DC unbalanced magnetron sputtering

AU - Audronis, Martynas

AU - Leyland, A.

AU - Matthews, Allan

AU - Kiryukhantsev-Korneev, Fillip V.

AU - Shtansky, Dmitry V.

AU - Levashov, Evgeny A.

PY - 2007/12/1

Y1 - 2007/12/1

N2 - The structure and mechanical properties of direct current (DC) and pulsed-DC unbalanced magnetron-sputtered Ti-Si-B thin films - hard coatings with the potential for excellent thermal stability and oxidation resistance - are investigated and reported in this paper. The coatings were deposited from composite sputter targets of titanium silicide/boride produced by self-propagating high-temperature synthesis (SHS), a novel and cost-effective technique to produce bulk materials of complex compositions which are difficult to synthesise by other means. Hard (up to 37 GPa) Ti-Si-B coatings possessing amorphous, nanocrystalline and crystalline structures were deposited. The application of pulsed magnetron sputtering (PMS) was found to affect significantly the coating properties such as structure, thickness, hardness (H), reduced elastic modulus (Er) and thus H/Er ratio.

AB - The structure and mechanical properties of direct current (DC) and pulsed-DC unbalanced magnetron-sputtered Ti-Si-B thin films - hard coatings with the potential for excellent thermal stability and oxidation resistance - are investigated and reported in this paper. The coatings were deposited from composite sputter targets of titanium silicide/boride produced by self-propagating high-temperature synthesis (SHS), a novel and cost-effective technique to produce bulk materials of complex compositions which are difficult to synthesise by other means. Hard (up to 37 GPa) Ti-Si-B coatings possessing amorphous, nanocrystalline and crystalline structures were deposited. The application of pulsed magnetron sputtering (PMS) was found to affect significantly the coating properties such as structure, thickness, hardness (H), reduced elastic modulus (Er) and thus H/Er ratio.

KW - Mechanical properties

KW - Pulsed magnetron sputtering

KW - Structure

KW - Ti-Si-B coatings

UR - https://www.scopus.com/pages/publications/43049137165

U2 - 10.1002/ppap.200731706

DO - 10.1002/ppap.200731706

M3 - Article

AN - SCOPUS:43049137165

SN - 1612-8850

VL - 4

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

IS - SUPPL.1

ER -

The structure and mechanical properties of Ti-Si-B coatings deposited by DC and pulsed-DC unbalanced magnetron sputtering

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Keywords

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