TY - JOUR
T1 - The vacancy-donor pair in unstrained silicon, germanium and SiGe alloys
AU - Peaker, A. R.
AU - Markevich, V. P.
AU - Auret, F. D.
AU - Dobaczewski, L.
AU - Abrosimov, N.
PY - 2005/6/8
Y1 - 2005/6/8
N2 - The thermal stability and electronic properties of the vacancy-donor complexes, often referred to as the E centres, have been studied in silicon, unstrained silicon-germanium and pure germanium. The E centres have been introduced by electron irradiation or gamma rays. In silicon, Laplace deep level transient spectroscopy has been used to separate the E centre emission from the di-vacancy, thus enabling very reliable data to be obtained for the vacancy complexes with P, As and Sb. In pure Ge only the E centres associated with P and Sb are reported and in Ge rich SiGe only V-P. In all the samples measured the thermal stability of V-Sb has been found to be significantly higher than V-P. With regard to the energy levels, the activation energy of electron emission from the single-acceptor level of the E centre in silicon are for V-Sb 0.40 eV and for V-P 0.46 eV. For the pure Ge case, the single acceptor is a hole trap with emission to the valence band having energies for V-P of 0. 35 eV and V-Sb of 0.31 eV. Similar values are found for Ge rich SiGe. The double-acceptor state is not seen in silicon but in germanium produces a state with an activation energy for electron emission of 0.30 eV for V-P and 0.38 eV for V-Sb. This is also reflected in the Ge rich alloys of SiGe:P that have been measured in this work.
AB - The thermal stability and electronic properties of the vacancy-donor complexes, often referred to as the E centres, have been studied in silicon, unstrained silicon-germanium and pure germanium. The E centres have been introduced by electron irradiation or gamma rays. In silicon, Laplace deep level transient spectroscopy has been used to separate the E centre emission from the di-vacancy, thus enabling very reliable data to be obtained for the vacancy complexes with P, As and Sb. In pure Ge only the E centres associated with P and Sb are reported and in Ge rich SiGe only V-P. In all the samples measured the thermal stability of V-Sb has been found to be significantly higher than V-P. With regard to the energy levels, the activation energy of electron emission from the single-acceptor level of the E centre in silicon are for V-Sb 0.40 eV and for V-P 0.46 eV. For the pure Ge case, the single acceptor is a hole trap with emission to the valence band having energies for V-P of 0. 35 eV and V-Sb of 0.31 eV. Similar values are found for Ge rich SiGe. The double-acceptor state is not seen in silicon but in germanium produces a state with an activation energy for electron emission of 0.30 eV for V-P and 0.38 eV for V-Sb. This is also reflected in the Ge rich alloys of SiGe:P that have been measured in this work.
UR - http://www.scopus.com/inward/record.url?scp=21144436012&partnerID=8YFLogxK
U2 - 10.1088/0953-8984/17/22/018
DO - 10.1088/0953-8984/17/22/018
M3 - Article
AN - SCOPUS:21144436012
SN - 0953-8984
VL - 17
SP - S2293-S2302
JO - Journal of Physics Condensed Matter
JF - Journal of Physics Condensed Matter
IS - 22
ER -