Time-resolved in-situ spectroscopic monitoring of the CVD of tin oxide onto a glass substrate

Robert J. Holdsworth, Philip A. Martin, Deborah Raisbeck, Juan Rivero, Helen E. Sanders, David Sheel, Martyn E. Pemble

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Near-infrared diode laser absorption spectroscopy has been demonstrated as an in-situ, non-invasive probe for use with a CVD reactor. The technique has been applied to the CVD of tin oxide onto a glass substrate, and by monitoring the evolution of methane in the reactor, it has been shown that the concentration of methane is correlated with the deposition rate of the tin oxide film. This illustrates the powerful possibilities for monitoring thin film production and properties, in-situ, during deposition.
    Original languageEnglish
    Pages (from-to)39-43
    Number of pages4
    JournalChemical Vapor Deposition
    Volume7
    Issue number1
    DOIs
    Publication statusPublished - Jan 2001

    Keywords

    • Glass substrates
    • In-situ monitoring
    • IR spectroscopy
    • Tin oxide films

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