ToF-SIMS studies of sulfuric acid hydrate films

John S. Fletcher, Alex Henderson, Andrew B. Horn, John C. Vickerman

    Research output: Contribution to journalArticlepeer-review

    Abstract

    A variety of sulfuric acid hydrate films, formed by the co-deposition of SO3 and H2O on a cooled substrate, have been analyzed using time-of-flight secondary ion mass spectrometry (ToF-SIMS). The films were produced using procedures developed in recent infrared spectroscopic studies. Spectra have been shown to consist of a series of identifiable fragments, the change in intensities of which can be related to changes in temperature and the relative abundance of H2O during the deposition of the film under UHV conditions. Depth profiling of the films shows clear evidence of separate surface species on some films and supports the existence of surface molecular hydrates over a stable bulk hydrate film.
    Original languageEnglish
    Pages (from-to)5960-5966
    Number of pages6
    JournalJournal of Physical Chemistry B
    Volume108
    Issue number19
    DOIs
    Publication statusPublished - 13 May 2004

    Keywords

    • Surface structure
    • UV radiation (ToF-SIMS studies of deposition conditions and UV irradn. on surface structure and reaction mechanism of sulfuric acid hydrate films deposited using SO3 and H2O on cooled substrate,)
    • Reaction mechanism (surface
    • ToF-SIMS studies of deposition conditions and UV irradn. on surface structure and reaction mechanism of sulfuric acid hydrate films deposited using SO3 and H2O on cooled substrate,)
    • deposition sulfuric acid hydrate film surface structure mass spectrometry

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