Tribenzyltin(IV)chloride thiosemicarbazones: Novel single source precursors for growth of SnS thin films

Balasaheb P. Bade; Shivram S. Garje; Yogesh S. Niwate; Mohammad Afzaal; Paul O'Brien

doi:10.1002/cvde.200806687

Tribenzyltin(IV)chloride thiosemicarbazones: Novel single source precursors for growth of SnS thin films

Balasaheb P. Bade, Shivram S. Garje, Yogesh S. Niwate, Mohammad Afzaal, Paul O'Brien

Research output: Contribution to journal › Article › peer-review

Abstract

Tin sulfide (SnS) thin films are deposited using simple tin thiosemicarbazone complexes of the type Bz3SnCl(L) (L = thiosemicarbazones of salicylaldehye and 4-chlorobenzaldehyde). Thin films are deposited using aerosol-assisted (AA) CVD in the range 375-475°C. X-ray diffraction (XRD) shows the formation of SnS regardless of growth temperature and precursor type. Scanning electron microscope (SEM) images show that the films have wafer-like morphology, and the growth temperatures do not have a profound effect on morphology. © 2008 WILEY-VCH Verlag GmbH & Co. KGaA.

Original language	English
Pages (from-to)	292-295
Number of pages	3
Journal	Chemical Vapor Deposition
Volume	14
Issue number	9-10
DOIs	https://doi.org/10.1002/cvde.200806687
Publication status	Published - Sept 2008

Keywords

Single-source precursors
Thin films
Tin sulfide
Tin thiosemicarbazones

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title = "Tribenzyltin(IV)chloride thiosemicarbazones: Novel single source precursors for growth of SnS thin films",

abstract = "Tin sulfide (SnS) thin films are deposited using simple tin thiosemicarbazone complexes of the type Bz3SnCl(L) (L = thiosemicarbazones of salicylaldehye and 4-chlorobenzaldehyde). Thin films are deposited using aerosol-assisted (AA) CVD in the range 375-475°C. X-ray diffraction (XRD) shows the formation of SnS regardless of growth temperature and precursor type. Scanning electron microscope (SEM) images show that the films have wafer-like morphology, and the growth temperatures do not have a profound effect on morphology. {\textcopyright} 2008 WILEY-VCH Verlag GmbH & Co. KGaA.",

keywords = "Single-source precursors, Thin films, Tin sulfide, Tin thiosemicarbazones",

author = "Bade, {Balasaheb P.} and Garje, {Shivram S.} and Niwate, {Yogesh S.} and Mohammad Afzaal and Paul O'Brien",

note = "Times Cited: 6",

year = "2008",

month = sep,

doi = "10.1002/cvde.200806687",

language = "English",

volume = "14",

pages = "292--295",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "John Wiley & Sons Ltd",

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TY - JOUR

T1 - Tribenzyltin(IV)chloride thiosemicarbazones: Novel single source precursors for growth of SnS thin films

AU - Bade, Balasaheb P.

AU - Garje, Shivram S.

AU - Niwate, Yogesh S.

AU - Afzaal, Mohammad

AU - O'Brien, Paul

N1 - Times Cited: 6

PY - 2008/9

Y1 - 2008/9

N2 - Tin sulfide (SnS) thin films are deposited using simple tin thiosemicarbazone complexes of the type Bz3SnCl(L) (L = thiosemicarbazones of salicylaldehye and 4-chlorobenzaldehyde). Thin films are deposited using aerosol-assisted (AA) CVD in the range 375-475°C. X-ray diffraction (XRD) shows the formation of SnS regardless of growth temperature and precursor type. Scanning electron microscope (SEM) images show that the films have wafer-like morphology, and the growth temperatures do not have a profound effect on morphology. © 2008 WILEY-VCH Verlag GmbH & Co. KGaA.

AB - Tin sulfide (SnS) thin films are deposited using simple tin thiosemicarbazone complexes of the type Bz3SnCl(L) (L = thiosemicarbazones of salicylaldehye and 4-chlorobenzaldehyde). Thin films are deposited using aerosol-assisted (AA) CVD in the range 375-475°C. X-ray diffraction (XRD) shows the formation of SnS regardless of growth temperature and precursor type. Scanning electron microscope (SEM) images show that the films have wafer-like morphology, and the growth temperatures do not have a profound effect on morphology. © 2008 WILEY-VCH Verlag GmbH & Co. KGaA.

KW - Single-source precursors

KW - Thin films

KW - Tin sulfide

KW - Tin thiosemicarbazones

U2 - 10.1002/cvde.200806687

DO - 10.1002/cvde.200806687

M3 - Article

SN - 0948-1907

VL - 14

SP - 292

EP - 295

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 9-10

ER -

Tribenzyltin(IV)chloride thiosemicarbazones: Novel single source precursors for growth of SnS thin films

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Keywords

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