Trivacancy in silicon: A combined DLTS and ab-initio modeling study

V. P. Markevich*, A. R. Peaker, S. B. Lastovskii, L. I. Murin, J. Coutinho, A. V. Markevich, V. J B Torres, P. R. Briddon, L. Dobaczewski, E. V. Monakhov, B. G. Svensson

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Deep level transient spectroscopy and ab-initio modeling have been used for identification of energy levels and structure of trivacancy (V3) in Si. It is found that in the neutral charge state the V3 is bistable, with the "fourfold" configuration being lower in energy than the (1 1 0) planar configuration. V3 in the (1 1 0) planar configuration gives rise to two acceptor levels at Ec-0.36 eV and Ec-0.46 eV in the gap, while in the "fourfold" configuration the defect has trigonal symmetry and an acceptor level at Ec-0.075 eV.

    Original languageEnglish
    Pages (from-to)4565-4567
    Number of pages3
    JournalPhysica B: Condensed Matter
    Volume404
    Issue number23-24
    DOIs
    Publication statusPublished - 15 Dec 2009

    Keywords

    • Ab-initio modeling
    • DLTS
    • Energy levels
    • Silicon
    • Trivacancy

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