@article{216abff58b8f43b2b082138bbdab2c57,
title = "Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography",
abstract = "A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half-pitch but at the expense of a low sensitivity. To improve sensitivity a 3D Monte Carlo simulation is used that utilizes a secondary and Auger electron generation model. The simulation suggests that the sensitivity can be dramatically improved while maintaining high resolution by incorporating appropriate chemical functionality around the metal–organic core. The new resists designs based on the simulation have the increased sensitivity expected and illustrate the value of the simulation approach.",
keywords = "3D Monte Carlo Simulation, electron beam lithography, metal–organic electron beam resists",
author = "Lewis, {Scott M.} and DeRose, {Guy A.} and Alty, {Hayden R.} and Hunt, {Matthew S.} and Nathan Lee and Mann, {James A.} and Richard Grindell and Alex Wertheim and {De Rose}, Lucia and Antonio Fernandez and Muryn, {Christopher A.} and Whitehead, {George F.S.} and Timco, {Grigore A.} and Axel Scherer and Winpenny, {Richard E.P.}",
note = "Funding Information: This work was supported by the EPSRC (UK) (EP/P000444/1 and EP/R023158/1) including an Established Career Fellowship to R.E.P.W. (EP/R011079/1) and by an Innovate UK award (Project Number 18238). The authors gratefully acknowledge critical support and infrastructure provided for this work by the Kavli Nanoscience Institute at Caltech. Funding Information: This work was supported by the EPSRC (UK) (EP/P000444/1 and EP/R023158/1) including an Established Career Fellowship to R.E.P.W. (EP/R011079/1) and by an Innovate UK award (Project Number 18238). The authors gratefully acknowledge critical support and infrastructure provided for this work by the Kavli Nanoscience Institute at Caltech. Publisher Copyright: {\textcopyright} 2022 The Authors. Advanced Functional Materials published by Wiley-VCH GmbH.",
year = "2022",
month = aug,
day = "8",
doi = "10.1002/adfm.202202710",
language = "English",
volume = "32",
journal = "Advanced Functional Materials",
issn = "1616-301X",
publisher = "John Wiley & Sons Ltd",
number = "32",
}