Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Scott M. Lewis; Guy A. DeRose; Hayden R. Alty; Matthew S. Hunt; Nathan Lee; James A. Mann; Richard Grindell; Alex Wertheim; Lucia De Rose; Antonio Fernandez; Christopher A. Muryn; George F.S. Whitehead; Grigore A. Timco; Axel Scherer; Richard E.P. Winpenny

doi:10.1002/adfm.202202710

Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Scott M. Lewis^*
, Guy A. DeRose
, Hayden R. Alty
, Matthew S. Hunt
, Nathan Lee
, James A. Mann
, Richard Grindell
, Alex Wertheim
, Lucia De Rose
, Antonio Fernandez
, Christopher A. Muryn
, George F.S. Whitehead
, Grigore A. Timco
, Axel Scherer
, Richard E.P. Winpenny

^*Corresponding author for this work

California Institute of Technology

Research output: Contribution to journal › Article › peer-review

Abstract

A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half-pitch but at the expense of a low sensitivity. To improve sensitivity a 3D Monte Carlo simulation is used that utilizes a secondary and Auger electron generation model. The simulation suggests that the sensitivity can be dramatically improved while maintaining high resolution by incorporating appropriate chemical functionality around the metal–organic core. The new resists designs based on the simulation have the increased sensitivity expected and illustrate the value of the simulation approach.

Original language	English
Article number	2202710
Journal	Advanced Functional Materials
Volume	32
Issue number	32
DOIs	https://doi.org/10.1002/adfm.202202710
Publication status	Published - 8 Aug 2022

Keywords

3D Monte Carlo Simulation
electron beam lithography
metal–organic electron beam resists

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10.1002/adfm.202202710

Cite this

Lewis, S. M., DeRose, G. A., Alty, H. R., Hunt, M. S., Lee, N., Mann, J. A., Grindell, R., Wertheim, A., De Rose, L., Fernandez, A., Muryn, C. A., Whitehead, G. F. S., Timco, G. A., Scherer, A., & Winpenny, R. E. P. (2022). Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography. Advanced Functional Materials, 32(32), Article 2202710. https://doi.org/10.1002/adfm.202202710

@article{216abff58b8f43b2b082138bbdab2c57,

title = "Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography",

abstract = "A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half-pitch but at the expense of a low sensitivity. To improve sensitivity a 3D Monte Carlo simulation is used that utilizes a secondary and Auger electron generation model. The simulation suggests that the sensitivity can be dramatically improved while maintaining high resolution by incorporating appropriate chemical functionality around the metal–organic core. The new resists designs based on the simulation have the increased sensitivity expected and illustrate the value of the simulation approach.",

keywords = "3D Monte Carlo Simulation, electron beam lithography, metal–organic electron beam resists",

author = "Lewis, \{Scott M.\} and DeRose, \{Guy A.\} and Alty, \{Hayden R.\} and Hunt, \{Matthew S.\} and Nathan Lee and Mann, \{James A.\} and Richard Grindell and Alex Wertheim and \{De Rose\}, Lucia and Antonio Fernandez and Muryn, \{Christopher A.\} and Whitehead, \{George F.S.\} and Timco, \{Grigore A.\} and Axel Scherer and Winpenny, \{Richard E.P.\}",

note = "Funding Information: This work was supported by the EPSRC (UK) (EP/P000444/1 and EP/R023158/1) including an Established Career Fellowship to R.E.P.W. (EP/R011079/1) and by an Innovate UK award (Project Number 18238). The authors gratefully acknowledge critical support and infrastructure provided for this work by the Kavli Nanoscience Institute at Caltech. Funding Information: This work was supported by the EPSRC (UK) (EP/P000444/1 and EP/R023158/1) including an Established Career Fellowship to R.E.P.W. (EP/R011079/1) and by an Innovate UK award (Project Number 18238). The authors gratefully acknowledge critical support and infrastructure provided for this work by the Kavli Nanoscience Institute at Caltech. Publisher Copyright: {\textcopyright} 2022 The Authors. Advanced Functional Materials published by Wiley-VCH GmbH.",

year = "2022",

month = aug,

day = "8",

doi = "10.1002/adfm.202202710",

language = "English",

volume = "32",

journal = "Advanced Functional Materials",

issn = "1616-301X",

publisher = "John Wiley \& Sons Ltd",

number = "32",

}

Lewis, SM, DeRose, GA, Alty, HR, Hunt, MS, Lee, N, Mann, JA, Grindell, R, Wertheim, A, De Rose, L, Fernandez, A, Muryn, CA, Whitehead, GFS, Timco, GA, Scherer, A & Winpenny, REP 2022, 'Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography', Advanced Functional Materials, vol. 32, no. 32, 2202710. https://doi.org/10.1002/adfm.202202710

TY - JOUR

T1 - Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

AU - Lewis, Scott M.

AU - DeRose, Guy A.

AU - Alty, Hayden R.

AU - Hunt, Matthew S.

AU - Lee, Nathan

AU - Mann, James A.

AU - Grindell, Richard

AU - Wertheim, Alex

AU - De Rose, Lucia

AU - Fernandez, Antonio

AU - Muryn, Christopher A.

AU - Whitehead, George F.S.

AU - Timco, Grigore A.

AU - Scherer, Axel

AU - Winpenny, Richard E.P.

N1 - Funding Information: This work was supported by the EPSRC (UK) (EP/P000444/1 and EP/R023158/1) including an Established Career Fellowship to R.E.P.W. (EP/R011079/1) and by an Innovate UK award (Project Number 18238). The authors gratefully acknowledge critical support and infrastructure provided for this work by the Kavli Nanoscience Institute at Caltech. Funding Information: This work was supported by the EPSRC (UK) (EP/P000444/1 and EP/R023158/1) including an Established Career Fellowship to R.E.P.W. (EP/R011079/1) and by an Innovate UK award (Project Number 18238). The authors gratefully acknowledge critical support and infrastructure provided for this work by the Kavli Nanoscience Institute at Caltech. Publisher Copyright: © 2022 The Authors. Advanced Functional Materials published by Wiley-VCH GmbH.

PY - 2022/8/8

Y1 - 2022/8/8

N2 - A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half-pitch but at the expense of a low sensitivity. To improve sensitivity a 3D Monte Carlo simulation is used that utilizes a secondary and Auger electron generation model. The simulation suggests that the sensitivity can be dramatically improved while maintaining high resolution by incorporating appropriate chemical functionality around the metal–organic core. The new resists designs based on the simulation have the increased sensitivity expected and illustrate the value of the simulation approach.

AB - A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half-pitch but at the expense of a low sensitivity. To improve sensitivity a 3D Monte Carlo simulation is used that utilizes a secondary and Auger electron generation model. The simulation suggests that the sensitivity can be dramatically improved while maintaining high resolution by incorporating appropriate chemical functionality around the metal–organic core. The new resists designs based on the simulation have the increased sensitivity expected and illustrate the value of the simulation approach.

KW - 3D Monte Carlo Simulation

KW - electron beam lithography

KW - metal–organic electron beam resists

UR - https://www.scopus.com/pages/publications/85130604803

U2 - 10.1002/adfm.202202710

DO - 10.1002/adfm.202202710

M3 - Article

AN - SCOPUS:85130604803

SN - 1616-301X

VL - 32

JO - Advanced Functional Materials

JF - Advanced Functional Materials

IS - 32

M1 - 2202710

ER -

Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Abstract

Keywords

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Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Abstract

Keywords

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Core Facility For X-ray Diffraction

Small Molecule XRD Facility

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