Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Scott M. Lewis*, Guy A. DeRose, Hayden R. Alty, Matthew S. Hunt, Nathan Lee, James A. Mann, Richard Grindell, Alex Wertheim, Lucia De Rose, Antonio Fernandez, Christopher A. Muryn, George F.S. Whitehead, Grigore A. Timco, Axel Scherer, Richard E.P. Winpenny

*Corresponding author for this work

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