Very-high-rate reactive sputtering of alumina hard coatings

J. M. Schneider, W. D. Sproul, R. W.J. Chia, Ming Show Wong, A. Matthews

Research output: Contribution to journalArticlepeer-review


A very-high-rate reactive magnetron sputtering deposition process for alumina hard coatings at substrate temperatures ≤250 °C has been developed. Utilizing pulsed DC power to sputter Al + AlO x off the target surface and partial pressure control of the reactive gas to maintain a certain partial pressure value (accuracy of better than 0.005 mtorr), fully dense, transparent alumina coatings could be produced at 76% of the metal deposition rate. The coatings have an elastic modulus of 140 GPa, a hardness of 12 GPa, a chemical composition close to stoichiometric, and a refractive index of 1.65. The influence of the O 2 partial pressure on the deposition rate, optical and mechanical properties is discussed.

Original languageEnglish
Pages (from-to)262-266
Number of pages5
JournalSurface and Coatings Technology
Issue number2-3
Publication statusPublished - 25 Nov 1997


  • Alumina
  • High deposition rate
  • Magnetron sputtering


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