Nanoscale Advanced Materials Engineering via Localised Ion Implantation

Abstract

The use of ion implantation for materials modification has a long standing history in semiconductor manufacturing. As such, the use of advanced focused ion beam implantation techniques is an attractive prospect for next generation technologies due to the ease of integration into current fabrication methods. One such advanced ion implantation system, unique in the world, is the Platform for Nanoscale Materials Engineering (P-NAME). The system was designed to perform deterministic implantation of single ions, but is also capable of higher dose implantation work for alloying and enrichment purposes. All of this work is possible with isotopic selectivity of the multi-species alloy ion source, a capability that sets the P-NAME system above and beyond any other comparable systems. The development of P-NAME, the current state of the tool, and demonstrations of its versatility are provided in this work, along with discussions of current and future work for which this system will be invaluable.

Date of Award	1 Aug 2022
Original language	English
Awarding Institution	The University of Manchester
Supervisor	Richard Curry (Supervisor) & Matthew Halsall (Supervisor)