Surface Assembly and Applications of Molecular Nanomagnets

Abstract

Understanding science at the interface is becoming increasingly important as technologies transition towards a new era of non-classical electronics. In order to exploit the special phenomena of quantum information processing, and develop increasing complex nanoscale devices, it is necessary to demonstrate previously unachievable levels of control and precision. Here, I investigate the deposition of magnetic molecules onto graphene, with a view to future computing devices, and on silicon, as a new class of lithographic resist. I find that from a range of tested methods, sublimation deposition techniques enable the highest level of control. This was possible through the design of a high vacuum deposition manifold, which was able to trace the sublimation and deposition in situ. The successful deposition of magnetic molecules on graphene represents an important advance for their implementation in real devices. On the other hand, magnetic molecules on silicon surfaces act as lithographic resists with outstanding performance metrics, enabling resolutions which rival the very best commercially available products. This thesis thus explores concepts at the very forefront of chemistry, materials, and computer science, and lays a solid foundation for the development of future nanoelectronics.

Date of Award	31 Dec 2015
Original language	English
Awarding Institution	The University of Manchester
Supervisor	Aravind Vijayaraghavan (Supervisor)